Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
نویسندگان
چکیده
منابع مشابه
Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography.
Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact table-top set up.
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ژورنال
عنوان ژورنال: Optics Express
سال: 2007
ISSN: 1094-4087
DOI: 10.1364/oe.15.003465